1. Identity statement | |
Reference Type | Journal Article |
Site | plutao.sid.inpe.br |
Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
Identifier | J8LNKAN8RW/3C63EQE |
Repository | dpi.inpe.br/plutao/2012/06.21.17.26 (restricted access) |
Last Update | 2013:07.02.17.41.36 (UTC) administrator |
Metadata Repository | dpi.inpe.br/plutao/2012/06.21.17.26.18 |
Metadata Last Update | 2018:06.04.23.39.04 (UTC) administrator |
DOI | 10.1016/j.vacuum.2012.03.049 |
ISSN | 0042-207X |
Label | lattes: 4955583664355437 2 OliveiraVieiUeda:2012:GrZnNa |
Citation Key | OliveiraVieiUedaTóth:2013:GrZnNa |
Title | Growth of ZnO nanostructures on Si by means of plasma immersion ion implantation and deposition |
Year | 2013 |
Month | Mar. |
Access Date | 2024, May 19 |
Secondary Type | PRE PI |
Number of Files | 2 |
Size | 1543 KiB |
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2. Context | |
Author | 1 Oliveira, Rogério de Moraes 2 Vieira, Maxson Souza 3 Ueda, Mário 4 Tóth, A |
Resume Identifier | 1 8JMKD3MGP5W/3C9JJ6L 2 3 8JMKD3MGP5W/3C9JHSB |
Group | 1 LAP-CTE-INPE-MCTI-GOV-BR 2 CMS-ETES-SPG-INPE-MCTI-GOV-BR 3 LAP-CTE-INPE-MCTI-GOV-BR |
Affiliation | 1 Instituto Nacional de Pesquisas Espaciais (INPE) 2 3 Instituto Nacional de Pesquisas Espaciais (INPE) 4 CRC HAS, Inst Mat & Environm Chem, Budapest, Hungary. |
Author e-Mail Address | 1 rogerio@plasma.inpe.br 2 maxson.vieira@gmail.com 3 ueda@plasma.inpe.br |
e-Mail Address | maxson.vieira@gmail.com |
Journal | Vacuum |
Volume | 89 |
Number | 1 |
Pages | 163-167 |
Secondary Mark | B1 B1 B1 B1 B2 B3 B4 |
History (UTC) | 2012-06-22 00:10:59 :: lattes -> secretaria.cpa@dir.inpe.br :: 2012 2012-08-31 19:13:53 :: secretaria.cpa@dir.inpe.br -> banon :: 2012 2012-09-27 14:58:38 :: banon -> administrator :: 2012 2012-10-22 01:02:30 :: administrator -> secretaria.cpa@dir.inpe.br :: 2012 2013-01-07 17:48:28 :: secretaria.cpa@dir.inpe.br -> administrator :: 2012 2013-07-02 17:31:22 :: administrator :: 2012 -> 2013 2018-06-04 23:39:04 :: administrator -> marcelo.pazos@inpe.br :: 2013 |
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3. Content and structure | |
Is the master or a copy? | is the master |
Content Stage | completed |
Transferable | 1 |
Content Type | External Contribution |
Version Type | publisher |
Keywords | AFM image Argon glow discharges Coated surface Composition analysis DC voltage Depth analysis Nanoscale ranges Nanothorns Negative voltage Oxide cathode Plasma based ion implantation and deposition Plasma immersion ion implantation and deposition Plasma particles Room temperature Sample holders Si substrates Si surfaces UV- and Visible photoluminescence XRD Zinc oxide (ZnO) Zn atoms Zn deposition ZnO ZnO nanoparticles ZnO nanostructures ZnO on Si Atomic force microscopy Electric potential Energy dispersive spectroscopy Glow discharges Ion implantation Nanostructures Photoelectrons Photoluminescence Photoluminescence spectroscopy Plasma deposition Scanning electron microscopy Silicon Stoichiometry Thermionic emission X ray diffraction X ray photoelectron spectroscopy Zinc Zinc plating |
Abstract | Crystalline zinc oxide (ZnO) nanostructures have been grown on Si substrates by means of Plasma Based Ion Implantation and Deposition (PIII&D) at a temperature of about 300 C and in the presence of an argon glow discharge. In the process a crucible filled with small pieces of metallic zinc plays the role of the anode of the discharge itself, being polarized by positive DC voltage of about 400 V. Electrons produced by thermionic emission by an oxide cathode (Ba, Sr, Ca)O impact this crucible, causing its heating and vaporization of Zn. Partial ionization of Zn atoms takes place due to collisions with plasma particles. High negative voltage pulses (7 kV/40 ms/250 Hz) applied to the sample holder causes the implantation of metallic zinc into Si surface, while Zn deposition happens between pulses. After annealing at 700 C, strong UV and various visible photoluminescence bands are observed at room temperature, as well as the presence of ZnO nanoparticles. The coated surface was characterized in detail using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), energy dispersive spectroscopy (EDS), scanning electron microscopy (SEM), atomic force microscopy (AFM) and photoluminescence (PL) spectroscopy. XRD indicated the presence of only ZnO peaks after annealing. The composition analysis by EDS revealed distinct Zn/O stoichiometry relation depending on the conditions of the process. AFM images showed the formation of columns in the nanoscale range. Topography viewed by SEM showed the formation of structures similar to cactus with nanothorns. Depth analysis performed by XPS indicated an increase of concentration of metallic Zn with increasing depth and the exclusive presence of ZnO for outer regions. PIII&D allowed to growing nanostructures of ZnO on Si without the need of a buffer layer. |
Area | FISPLASMA |
doc Directory Content | access |
source Directory Content | there are no files |
agreement Directory Content | there are no files |
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4. Conditions of access and use | |
Language | en |
Target File | Growth of ZnO nanostructures on Si by means of plasma immersion ion implantation and deposition.pdf |
User Group | administrator banon lattes marcelo.pazos@inpe.br secretaria.cpa@dir.inpe.br |
Reader Group | administrator banon marcelo.pazos@inpe.br secretaria.cpa@dir.inpe.br |
Visibility | shown |
Archiving Policy | denypublisher denyfinaldraft24 |
Read Permission | deny from all and allow from 150.163 |
Update Permission | not transferred |
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5. Allied materials | |
Linking | Trabalho Vinculado à Tese/Dissertação |
Mirror Repository | iconet.com.br/banon/2006/11.26.21.31 |
Next Higher Units | 8JMKD3MGPCW/3ET2RFS 8JMKD3MGPCW/3F358GL |
Citing Item List | sid.inpe.br/bibdigital/2013/10.14.21.39 4 sid.inpe.br/mtc-m21/2012/07.13.14.59.24 2 sid.inpe.br/bibdigital/2013/09.25.21.49 1 |
Dissemination | WEBSCI; PORTALCAPES; COMPENDEX; SCOPUS. |
Host Collection | dpi.inpe.br/plutao@80/2008/08.19.15.01 |
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6. Notes | |
Notes | 17th International Conference on Surface Modification of Materials by Ion Beams (SMMIB), Harbin, PEOPLES R CHINA, SEP 13-17, 2011 |
Empty Fields | alternatejournal archivist callnumber copyholder copyright creatorhistory descriptionlevel format isbn lineage mark nextedition orcid parameterlist parentrepositories previousedition previouslowerunit progress project rightsholder schedulinginformation secondarydate secondarykey session shorttitle sponsor subject tertiarytype typeofwork url |
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7. Description control | |
e-Mail (login) | marcelo.pazos@inpe.br |
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